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https://hdl.handle.net/10316/4224
Title: | Synthesis, structural and mechanical characterization of sputtered tungsten oxide coatings | Authors: | Parreira, N. M. G. Carvalho, N. J. M. Cavaleiro, A. |
Keywords: | Tungsten oxide; Reactive sputtering; Structural properties; Mechanical properties | Issue Date: | 2006 | Citation: | Thin Solid Films. 510:1-2 (2006) 191-196 | Abstract: | Tungsten oxide coatings were deposited without substrate bias by DC reactive magnetron sputtering of a tungsten target using oxygen as reactive gas. By tuning the partial pressure of oxygen (pO2/pAr) between 0 and 4, the oxygen content of the films was changed from 0 to 75 at.%. The structure of the films (investigated by X-ray diffraction) depends on their oxygen content. For low oxygen contents, the [alpha]-W and [beta]-W3O phases were observed (<Â 30 at.%), and with the increase of oxygen content (30 at.%Â <Â OÂ <Â 67 at.%) the structure became amorphous. A transition region was obtained for oxygen content between 67 at.% and 75 at.%, and when OÂ >Â 75 at.%, a nanocrystalline (WO3) structure was reached. | URI: | https://hdl.handle.net/10316/4224 | DOI: | 10.1016/j.tsf.2005.12.299 | Rights: | openAccess |
Appears in Collections: | FCTUC Eng.Mecânica - Artigos em Revistas Internacionais |
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file07b7c85d20884bfbbebdd250b749570d.pdf | 563.08 kB | Adobe PDF | View/Open |
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