Please use this identifier to cite or link to this item: http://hdl.handle.net/10316/10109
Title: Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing
Authors: Kubart, Tomáscaron 
Polcar, Tomáscaron 
Kappertz, Oliver 
Parreira, Nuno 
Nyberg, Tomas 
Berg, Sören 
Cavaleiro, Albano 
Issue Date: 2007
Citation: Plasma Processes and Polymers. 4:S1 (2007) S522-S526
Abstract: Reactive sputtering is one of the most commonly employed processes for the deposition of thin films. However, the range of applications is limited by inherent instabilities, which necessitates the use of a complex feedback control of reactive gas (RG) partial pressure. Recently pulsing of the RG has been suggested as a possible alternative. In this report, the concept of periodically switching the RG flow between two different values is applied to the deposition of tungsten oxide. The trends in the measured time dependent RG pressure and discharge voltage are reproduced by a dynamical model developed for this process. Furthermore, the model predicts the compositional depth profile of the deposited film reasonably well, and in particular helps to understand the formation of the interfaces in the resulting multi-layer film.
URI: http://hdl.handle.net/10316/10109
DOI: 10.1002/ppap.200731301
Rights: openAccess
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais

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