Please use this identifier to cite or link to this item: https://hdl.handle.net/10316/4290
DC FieldValueLanguage
dc.contributor.authorCavaleiro, A.-
dc.contributor.authorLouro, C.-
dc.date.accessioned2008-09-01T10:45:21Z-
dc.date.available2008-09-01T10:45:21Z-
dc.date.issued2002en_US
dc.identifier.citationVacuum. 64:3-4 (2002) 211-218en_US
dc.identifier.urihttps://hdl.handle.net/10316/4290-
dc.description.abstractW---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm.en_US
dc.description.urihttp://www.sciencedirect.com/science/article/B6TW4-44PCFMC-6/1/9eb4f2ae932f9fa1dde3d75b37b5bb8een_US
dc.format.mimetypeaplication/PDFen
dc.language.isoengeng
dc.rightsopenAccesseng
dc.subjectW-Si-N coatingsen_US
dc.subjectHardnessen_US
dc.subjectNanostructureen_US
dc.subjectSputteringen_US
dc.titleNanocrystalline structure and hardness of thin filmsen_US
dc.typearticleen_US
dc.identifier.doi10.1016/S0042-207X(01)00337-2-
uc.controloAutoridadeSim-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.openairetypearticle-
item.cerifentitytypePublications-
item.grantfulltextopen-
item.fulltextCom Texto completo-
item.languageiso639-1en-
crisitem.author.researchunitCEMMPRE - Centre for Mechanical Engineering, Materials and Processes-
crisitem.author.researchunitCEMMPRE - Centre for Mechanical Engineering, Materials and Processes-
crisitem.author.orcid0000-0001-8251-5099-
crisitem.author.orcid0000-0002-8142-0650-
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais
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