Please use this identifier to cite or link to this item:
https://hdl.handle.net/10316/4290| Title: | Nanocrystalline structure and hardness of thin films | Authors: | Cavaleiro, A. Louro, C. |
Keywords: | W-Si-N coatings; Hardness; Nanostructure; Sputtering | Issue Date: | 2002 | Citation: | Vacuum. 64:3-4 (2002) 211-218 | Abstract: | W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. | URI: | https://hdl.handle.net/10316/4290 | DOI: | 10.1016/S0042-207X(01)00337-2 | Rights: | openAccess |
| Appears in Collections: | FCTUC Eng.Mecânica - Artigos em Revistas Internacionais |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| filebba10f2696e2447195cab3b8380f077d.pdf | 176.01 kB | Adobe PDF | View/Open |
SCOPUSTM
Citations
45
checked on Nov 9, 2022
WEB OF SCIENCETM
Citations
20
35
checked on May 2, 2023
Page view(s) 50
500
checked on Apr 23, 2024
Download(s)
292
checked on Apr 23, 2024
Google ScholarTM
Check
Altmetric
Altmetric
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.